Reactive ion etching of gold-nanoparticle-modified pyrolyzed photoresist films

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Volumn 5, Issue 22, 2009, Pages 2510-2513

  Polsky, Ronen ^a   Washburn, Cody M ^a   Montano, Gabriel ^b   Liu, Haiqing ^b   Edwards, Thayne L ^a   Lopez, DeAnna M ^a   Harper, Jason C ^a   Brozik, Susan M ^a   Wheeler, David R ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

Carbon electrodes; Electrodeposition; Nanoparticles; Reactive ion etching

Indexed keywords

CARBON ELECTRODE; CARBON ELECTRODES; CARBON STRUCTURES; ELECTRODE MATERIAL; ELECTRODEPOSITION CONDITIONS; GOLD NANOPARTICLES; PYROLYZED PHOTORESIST FILMS;

ELECTRODEPOSITION; ELECTRODES; FILMS; IONS; NANOPARTICLES; PHOTORESISTORS; PHOTORESISTS; SURFACE PROPERTIES; SURFACE TREATMENT;

REACTIVE ION ETCHING;

GOLD; ION; NANOMATERIAL; NANOPARTICLE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; HEAT; MACROMOLECULE; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOCHEMISTRY; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; GOLD; HOT TEMPERATURE; IONS; MACROMOLECULAR SUBSTANCES; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOPARTICLES; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOCHEMISTRY; SURFACE PROPERTIES;

EID: 73349111317     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200901007     Document Type: Article

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