Fabrication of optically transparent carbon electrodes by the pyrolysis of photoresist films: Approach to single-molecule spectroelectrochemistry

Analytical Chemistry

Volumn 78, Issue 8, 2006, Pages 2816-2822

  Donner, Sebastian ^a   Li, Hung Wing ^a   Yeung, Edward S ^a   Porter, Marc D ^a  

^a IOWA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; OPTICAL PROPERTIES; PHOTORESISTS; PYROLYSIS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON-BASED OPTICALLY TRANSPARENT ELECTRODES (C-OTES); FILM THICKNESS; MOLECULE SPECTROELECTROCHEMISTRY;

ELECTRODES;

CARBON; DNA;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CYCLIC POTENTIOMETRY; DILUTION; ELECTROCHEMICAL ANALYSIS; ELECTROCHEMISTRY; ELECTRODE; FILM; MATERIAL COATING; MEASUREMENT; PHYSICAL CHEMISTRY; PYROLYSIS; RAMAN SPECTROMETRY; REPRODUCIBILITY; SPECTRAL SENSITIVITY; THICKNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33646136489     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac052244d     Document Type: Article

References (41)

1. Kuwana, T.; Winograd, N. In Electroanalytical Chemistry: Bard, A. J., Ed.; Marcel Dekker: New York, 1974; Vol. 7, pp 1-78.
2. Heineman, W. R.; Hawkridge, F. M.; Blount, H. N. Electroanal. Chem. 1984, 13, 1-113.
3. Stotter, J.; Raymond, S.; Zak, J. K; Show, Y.; Cvackova, Z.; Swain, G. M. Electrochem. Soc. Interface 2003, 12, 33-38.
4. Zudans, I.; Paddock, J. R.; Kuramitz, H.; Maghasi, A. T.; Wansapura, C. M.; Conklin, S. D.; Kaval, N.; Shtoyko, T.; Monk, D. J.; Bryan, S. A.; Hubler, T. L; Richardson, J. N.; Seliskar, C. J.; Heineman, W. R. J. Electroanal. Chem. 2004, 565, 311-320.
5. Mattson, J. S.; Smith, C. A. Anal. Chem. 1975, 47, 1122-1125.
6. Haacke, G. Annu. Rev. Mater. Sci. 1977, 7, 73-93.
7. DeAngelis, T. P.; Hurst, R. W.; Yacynych, A. M.; Mark, H. B.; Heineman, W. R.; Mattson, J. S. Anal. Chem. 1977, 49, 1395-1398.
8. Haymond, S.; Zak, J. K.; Show, Y.; Butler, J. E.; Babcock, G. T.; Swain, G. M. Anal. Chim. Acta 2003, 500, 137-144.
9. Petek, M.; Neal, T. E.; Murray, R. W. Anal. Chem. 1971, 43, 1069-1074.
10. Hong, H.; Porter, M. D. J. Electroanal. Chem. 2005, 578, 113-119.
11. Harnisch, J. A.; Porter, M. D. Analyst 2001, 126, 1841-1849.
12. Ponton, L.; Porter, M. D. Anal. Chem. 2004, 76, 5823-5828.
13. Keller, D. W.; Porter, M. D. Anal. Chem. 2005, 77, 7399-7407.
14. Randin, J. P.; Yeager, E. Electroanal. Chem. Interfacial Electrochem. 1975, 58, 313-322.
15. McCreery, R. L. In Interfacial Electrochemistry; Wieckowski, A., Ed.; Marcel Dekker: New York, 1999; pp 631-647.
16. Dawson J. C.; Adkins, C. J. J. Phys.: Condens. Matter 1995, 7, 6297-6315.
17. Anjo, D. M.; Brown, S.; Wang, W. Anal. Chem. 1993, 65, 317-319.
18. Lyons, A. M. J. Non-Cryst. Solids 1985, 70, 99-109.
19. Kim, J.; Song, X.; Kinoshita, K.; Madou, M.; White, R. J. Electrochem. Soc. 1998, 145, 2314-2319.
20. Ranganathan, S.; McCreery, R. L.; Majji, S. M. a.; Madou, M. J. Electrochem. Soc. 2000, 147, 277-282.
21. Kostecki, R.; Schnyder, B.; Alliata, D.; Song, X.; Kinoshita, K; Koetz, R. Thin Solid Films 2001, 396, 36-43.
22. Ranganathan, S.; McCreery, R. L. Anal. Chem. 2001, 73, 893.
23. Kang, S. H.; Shortreed, M. R.; Yeung, E. S. Anal. Chem. 2001, 73, 1091-1099.
24. Williams, M. W.; Arakawa, E. T. J. Appl. Phys. 1972, 43, 3460-3463.
25. Taft, E. A; Philipp, H. R. Phys. Rev. 1965, 138, A197-A202.
26. Greenaway, D. L.; Harbeke, G. Phys. Rev. 1969, 178, 1340-1348.
27. Adkins, C. J.; Hamilton, E. M. In Conduction in Low-Mobility Materials; Klein, N., Tannhauser, D. S., Pollak, M., Eds.; Taylor & Francis Ltd.: 1971; pp 229-233.
28. Levchenko, I.; Baranov, O. Vacuum 2004, 72, 205-210.
29. Hegner, M.; Wagner, P.; Semenza, G. Surf. Sci. 1993, 291, 39-46.
30. Wagner, P.; Hegner, M.; Guentherodt, H. J.; Semenza, G. Langmuir 1995, 11, 3867-3875.
31. Wong, S. S.; Porter, M. D. J. Electroanal. Chem. 2000, 485, 135-143.
32. MacVicar, M. L. A. J. Appl. Phys. 1970, 41, 4765-4768.
33. McLintock, I. S.; Orr, J. C. In Chemistry and Physics of Carbon; Walker, P. L., Thrower, P. A., Eds.; Marcel Dekker: New York, 1973; Vol. 11, pp 243-312.
34. Morgan, M. Thin Solid Films 1971, 7, 313-323.
35. Shporer, M.; Ron, G.; Loewenstein, A.; Navon, G. Inorg. Chem. 1965, 4, 361-364.
36. Based on the 35-nm electrode thickness and 0.3-cm working electrode radius, an internal resistance of ∼6.1 kΩ was measured.
37. Witek, M.; Wang, J.; Stotter, J.; Hupert, M.; Haymond; Sonthalia, P.; Swain, G. M. J. Wide Bandgap Mater. 2001, 8, 171-788.
38. Porter, M. D.; Kuwana, T. Anal. Chem. 1984, 56, 529-534.
39. He, Y.; Li, H. W.; Yeung, E. S. J. Phys. Chem. B 2005, 109, 8820-8832.
40. Li, H. W.; Park, H. Y.; Porter, M. D.; Yeung, E. S. Anal. Chem. 2005, 77, 3256-3260.
41. Since the actual electrode potential is unknown, the evolution of the images may also arise from a decrease in the negative charge density of the carbon electrode, depending on the location of the potential of zero charge with respect to the applied bias voltage.