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Thin Solid Films

Volumn 396, Issue 1-2, 2001, Pages 36-43

Surface studies of carbon films from pyrolyzed photoresist

(6) Kostecki, R a Schnyder, B b Alliata, D b Song, X a Kinoshita, K a Kotz R b

a LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

b PAUL SCHERRER INSTITUTE (Switzerland)

Author keywords

Atomic force microscopy; Carbon; Raman scattering; X Ray photoelectron spectroscopy

Indexed keywords

CARBON; PHOTORESISTS; PYROLYSIS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON FILMS;

THIN FILMS;

EID: 0035929004 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01185-3 Document Type: Article

Times cited : (158)

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