Two stage ion beam figuring and smoothening method for shape error correction of ULE® substrates of extreme ultraviolet lithography projection optics: Evaluation of high-spatial frequency roughness

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2900-2904

  Kamijo, Kazuma ^a   Uozumi, Ryou ^a   Moriziri, Kenta ^a   Pahlovy, S A ^a   Miyamoto, Iwao ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM DIAMETERS; FIGURE ERROR; HIGH ENERGY; ION BEAM FIGURING; LOW ENERGIES; PROJECTION OPTICS; SHAPE ERRORS; SPATIAL FREQUENCY; SPATIAL WAVELENGTHS; TWO STAGE;

BEAM PLASMA INTERACTIONS; ERROR CORRECTION; EXTREME ULTRAVIOLET LITHOGRAPHY; HIGH ENERGY PHYSICS; ION BEAMS; ION BOMBARDMENT; IONS; OPTICS; PHOTORESISTS; SPECIFICATIONS; SURFACE ROUGHNESS; ULTRAVIOLET DEVICES;

SUBSTRATES;

EID: 72849145551     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3258154     Document Type: Conference Paper

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