SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 497-499

Low energy ion beam machining of ULE® substrates: Evaluation of surface roughness

(6) Inaba, Takuro a Kurashima, Yuichi b Pahlovy, Shahjada A a Miyamoto, Iwao a Ando, Manabu c Numata, Atsushi c

a TOKYO UNIVERSITY OF SCIENCE (Japan)

b UNIVERSITY OF YAMANASHI (Japan)

c Extreme Ultra Violet Lithography System Development Association (Japan)

Author keywords

EUVL; HSFR; Ion beam; Machining; ULE

Indexed keywords

EUVL; HSFR; ION BEAM ENERGIES; ION BEAM FIGURING; ION BEAM MACHINING; LOW-ENERGY ION BEAMS; PROJECTION OPTICS; SHAPE CORRECTIONS; SPATIAL FREQUENCIES; ULE;

BEAM PLASMA INTERACTIONS; ION BEAMS; ION BOMBARDMENT; IONS; MACHINING; METAL ANALYSIS; PHOTORESISTS; SURFACE PROPERTIES; SURFACE ROUGHNESS;

SUBSTRATES;

EID: 67349086048 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2008.11.044 Document Type: Article

Times cited : (15)

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