SCOPUS 정보 검색 플랫폼

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7601-7604

Fabrication of aspherical mirrors for Extreme Ultra-Violet Lithography (EUVL) using deposition techniques

Author keywords

Aspherical mirror; EUV; Lithography; Multilayer; Soft X ray; Sputtering

Indexed keywords

MAGNETRON SPUTTERING; MASKS; MIRRORS; MULTILAYERS; PHOTOLITHOGRAPHY; RESIDUAL STRESSES; SURFACE ROUGHNESS; THIN FILMS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS; SOFT X RAYS;

ASPHERICS;

EID: 0031346369 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.36.7601 Document Type: Article

Times cited : (3)

References (12)

1
- 0000495919
- D. A. Tichenor et al.: Proc. SPIE 2437 (1996) 292.
- (1996) Proc. SPIE , vol.2437 , pp. 292
- Tichenor, D.A.¹

2
- 0000222824
- G. E. Sommergren: OSA TOPS Extreme Ultraviolet Lithography 4 (1996) 108.
- (1996) OSA TOPS Extreme Ultraviolet Lithography , vol.4 , pp. 108
- Sommergren, G.E.¹

3
- 0027680678
- C. Lee, D. Wan C. Jaing and C. Chu: Appl. Opt. 32 (1993) 5535.
- (1993) Appl. Opt. , vol.32 , pp. 5535
- Lee, C.¹ Wan, D.² Jaing, C.³ Chu, C.⁴

4
- 5244330976
- eds. G. D. Kubiak and D. R. Kania OSA, Washington, DC
- C. Tarrio, E. Spiller, C. J. Evans, T. B. Lucatorto and C. W. Clark: Extreme Ultraviolet Lithography, eds. G. D. Kubiak and D. R. Kania (OSA, Washington, DC, 1996) p. 144.
- (1996) Extreme Ultraviolet Lithography , pp. 144
- Tarrio, C.¹ Spiller, E.² Evans, C.J.³ Lucatorto, T.B.⁴ Clark, C.W.⁵

5
- 5244283342
- eds. G. D. Kubiak and D. R. Kania OSA, Washington, DC
- W. C. Sweatt, J. W. Weed, A. V. Fransworth, M. E. Warren, C. C. Newmann, R. S. Geoke and R. N. Shagarn: Extreme Ultraviolet Lithography, eds. G. D. Kubiak and D. R. Kania (OSA, Washington, DC, 1996) p. 149.
- (1996) Extreme Ultraviolet Lithography , pp. 149
- Sweatt, W.C.¹ Weed, J.W.² Fransworth, A.V.³ Warren, M.E.⁴ Newmann, C.C.⁵ Geoke, R.S.⁶ Shagarn, R.N.⁷

6
- 5244321958
- eds. G. D. Kubiak and D. R. Kania OSA, Washington, DC
- F. W. Waber, C. Montcalm, S. P. Vernon and D. R. Kania: Extreme Ultraviolet Lithography, eds. G. D. Kubiak and D. R. Kania (OSA, Washington, DC, 1996) p. 156.
- (1996) Extreme Ultraviolet Lithography , pp. 156
- Waber, F.W.¹ Montcalm, C.² Vernon, S.P.³ Kania, D.R.⁴

7
- 0001748094
- Y. Setsuhara, M. Kamai, S. Miyake, K. Higuchi, T. Uchiyama, Y. Kikuchi, K. Takagi and J. Musil: Proc. 2nd Int Conf. Reactive Plasma/11th Symp. Plasma Processing (1994) p. 549.
- (1994) Proc. 2nd Int Conf. Reactive Plasma/11th Symp. Plasma Processing , pp. 549
- Setsuhara, Y.¹ Kamai, M.² Miyake, S.³ Higuchi, K.⁴ Uchiyama, T.⁵ Kikuchi, Y.⁶ Takagi, K.⁷ Musil, J.⁸

8
- 0005246689
- eds. T. Namioka, H. Kinoshita and K. Ito JSPE, Tokyo
- T. Watanabe, H. Kinoshita and M. Niibe: JSPE Proc. Soft X-ray Optics, eds. T. Namioka, H. Kinoshita and K. Ito (JSPE, Tokyo, 1997) p. 341.
- (1997) JSPE Proc. Soft X-ray Optics , pp. 341
- Watanabe, T.¹ Kinoshita, H.² Niibe, M.³

9
- 0028421881
- D. L. Windt, W. K. Waskiewicz and J. E. Griffith: Appl. Opt. 33 (1994) 2025.
- (1994) Appl. Opt. , vol.33 , pp. 2025
- Windt, D.L.¹ Waskiewicz, W.K.² Griffith, J.E.³

10
- 5244332743
- M. Niibe, S. Ogura, M. Tsukamoto, T. Iizuka, A. Miyake, Y. Watanabe and Y. Fukuda: Rev. Laser Eng. 24 (1996) 48.
- (1996) Rev. Laser Eng. , vol.24 , pp. 48
- Niibe, M.¹ Ogura, S.² Tsukamoto, M.³ Iizuka, T.⁴ Miyake, A.⁵ Watanabe, Y.⁶ Fukuda, Y.⁷

11
- 0027795351
- D. G. Stearns, R. S. Rosen and S. P. Vernon: Appl. Opt. 32 (1993) 6952.
- (1993) Appl. Opt. , vol.32 , pp. 6952
- Stearns, D.G.¹ Rosen, R.S.² Vernon, S.P.³

12
- 0000073841
- G. G. Stoney: Proc. R. Soc. London Ser. A 82 (1909) 172.
- (1909) Proc. R. Soc. London Ser. A , vol.82 , pp. 172
- Stoney, G.G.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.