Active monitoring and control of electron beam induced contamination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 835-843

  Vladár, Andŕs E ^a,b   Postek, Michael T ^a   Vane, Ronald ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b XEI Scientific   (United States)

Author keywords

Accuracy; CD; CD SEM; Contamination; Linewidth; Lithography; Measurement; Metrology; Scanning electron microscope; SEM

Indexed keywords

CONTAMINATION; DEPOSITION; ELECTRON BEAMS; ERROR ANALYSIS; LITHOGRAPHY; MEASUREMENT ERRORS; VACUUM PUMPS;

CRITICAL DIMENSION (CD) MEASUREMENT;

SCANNING ELECTRON MICROSCOPY;

EID: 0034757309     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436724     Document Type: Article

References (3)

1. An approach to the reduction of hydrocarbon contamination in the SEM
2. Scanning electron microscope-based metrological electron microscope system and new prototype SEM magnification standard