Fabrication of nanodot array molds by using an inorganic electron-beam resist and a postexposure bake

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2832-2836

  Manabe, Tetsuro ^a   Taniguchi, Jun ^a   Ishikawa, Kiyoshi ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION VOLTAGES; DOT ARRAY; ELECTRON BEAM RESIST; HIGH COSTS; HIGH-VOLTAGES; LITHOGRAPHIC TECHNOLOGIES; LOW-VOLTAGE; NANO-DOT ARRAYS; PATTERN TRANSFERS; POSTEXPOSURE BAKE; TRANSFER PRESSURE; UV CURABLE;

CURING; HYDROFLUORIC ACID; MOLDS; NANOIMPRINT LITHOGRAPHY; NICKEL COMPOUNDS; PHOTOLITHOGRAPHY; PLASMA ETCHING; RESINS;

ELECTRON BEAM LITHOGRAPHY;

EID: 72849113666     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3253649     Document Type: Conference Paper

References (9)

1. K. Ogino, J. Taniguchi, S. Satake, K. Yamamoto, Y. Ishii, and K. Ishikawa, Microelectron. Eng. 84, 1071 (2007).
2. J. Fujita, Y. Ohshima, S. Manako, Y. Ochiai, E. Nomura, T. Sakamoto, and S. Matsui, J. Appl. Phys. 36, 7769 (1997).
3. M. Ishida, J. Fujita, T. Ogurai, Y. Ochai, E. Ohshima, and J. Momoda, J. Appl. Phys. 42, 3913 (2003).
4. S. Hosaka, T. Suzuki, M. Yamaoka, K. Katoh, F. Isshiki, M. Miyamoto, Y. Miyauchi, A. Arimoto, and T. Nishida Microelectron. Eng. 61-62, 309 (2002).
5. S. Hosaka, H. Sano, M. Shirai, and H. Sone, Microelectron. Eng. 83, 792 (2006).
6. S. Hosaka, Z. Mohamad, M. Shirai, H. Sano, Y. Yin, A. Miyachi, and H. Sone, Microelectron. Eng. 85, 774 (2008).
7. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhang, J. Vac. Sci. Technol. B 15, 2897 (1997).
8. M. Shizuno, J. Taniguchi, K. Ogino, and K. Ishikawa, J. Nanosci. Nanotechnol. 9, 562 (2009).
9. S. Spinner and A. Napolitano, J. Res. Natl. Bur. Stand., Sect. A 70A, 147 (1965).