Possibility to form an ultrahigh packed fine pit and dot arrays for future storage using EB writing

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 792-795

  Hosaka, Sumio ^a   Sano, Hirotaka ^a   Itoh, Kazuo ^a   Sone, Hayato ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

EB writing; Nano dot arrays; Nano pit arrays; Near field optical recording; Patterned media; Ultrahigh density recording

Indexed keywords

DENSITY (OPTICAL); OPTICAL RECORDING; SCANNING ELECTRON MICROSCOPY;

EB WRITING; NANO-DOT ARRAYS; NANO-PIT ARRAYS; NEAR-FIELD OPTICAL RECORDING;

ELECTRON BEAM LITHOGRAPHY;

EID: 33646069022     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.005     Document Type: Article

References (6)

1. K. Koike, C. Haginoya, O. Kitakami, Y. Shimada, Fabrication of patterned media by electron beam and focused ion beam, in: Int. Workshop on Patterned Media, Alabama, 2000s, pp. 15-20.
2. Hosaka S., et al. J. Appl. Phys. 79 (1996) 8082-8086
3. Hosaka S., Ichihashi M., Hayakawa H., Hishi S., and Migitaka M. Jpn. J. Appl. Phys. 21 (1982) 543-549
4. Fujita J., Ohnishi Y., Manako S., Ochiai Y., Nomura E., Sakamoto T., and Matsui S. Jpn. J. Appl. Phys. 36 (1997) 7769-7772
5. Ishida M., Fujita J., Ogurai T., Ochai Y., Ohshima E., and Momoda J. Jpn. J. Appl. Phys. 42 (2003) 3913-3916
6. Hosaka S., et al. Microelectron. Eng. 61-62 (2002) 309-316