Improving the sensitivity and line edge roughness in inorganic positive electron beam resist

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1071-1074

  Ogino, Kenta ^a   Taniguchi, Jun ^a   Satake, Shin ichi ^a   Yamamoto, Keisuke ^a   Ishii, Yoshiaki ^a   Ishikawa, Kiyoshi ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

Electron beam lithography; Inorganic resist; Line edge roughness; Nano imprint lithography; Photonic crystal

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; OPTICAL RESOLVING POWER; PHOTONIC CRYSTALS; PHOTORESISTS;

ELECTRON BEAM RESISTS; INORGANIC RESIST; LINE EDGE ROUGHNESS;

SURFACE ROUGHNESS;

CRYSTALS; LITHOGRAPHY; RESOLUTION; ROUGHNESS;

EID: 34247562310     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.144     Document Type: Article

References (5)

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