Electrochemical investigation of the surface energy: Effect of the HF concentration on electroless silver deposition onto p-Si (1 1 1)

Applied Surface Science

Volumn 253, Issue 7, 2007, Pages 3419-3424

  Ye, Weichun ^a   Chang, Yanlong ^a   Ma, Chuanli ^a   Jia, Bingyu ^a   Cao, Guiyan ^a   Wang, Chunming ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Direct current polarization; Electroless silver deposition; HF; Open circuit potential time (Ocp t) technique; Stress generation and relaxation; Surface energy

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; INDUCTIVELY COUPLED PLASMA; INTERFACIAL ENERGY; POLARIZATION; RELAXATION PROCESSES; SILICON; SILVER COMPOUNDS; SPECTROMETRY;

ATOMIC EMISSION SPECTROMETRY; DROP SLOPE; ELECTROCHEMICAL DIRECT CURRENT POLARIZATION; ELECTROLESS SILVER DEPOSITION; MIXED-POTENTIAL THEORY; OPEN-CIRCUIT POTENTIAL;

ELECTROLESS PLATING;

EID: 33846325116     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.07.049     Document Type: Article

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