Effects of substrate temperature on the properties of Mo-doped ZnO films prepared by RF magnetron sputtering

Journal of Materials Science and Technology

Volumn 25, Issue 6, 2009, Pages 785-788

  Xiu, Xianwu ^a   Cao, Yuping ^a   Pang, Zhiyong ^b   Han, Shenghao ^b,c  

^a SHANDONG NORMAL UNIVERSITY   (China)

^b SHANDONG UNIVERSITY   (China)

^c SHANDONG UNIVERSITY   (China)

Author keywords

Magnetron sputtering; Molybdenum; Substrate temperature; Zinc oxide

Indexed keywords

CRYSTALLINITIES; DIFFERENT SUBSTRATES; DOPED ZNO; GLASS SUBSTRATES; HEXAGONAL STRUCTURES; MOLYBDENUM SUBSTRATE; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SUBSTRATE TEMPERATURE; VISIBLE RANGE;

CARRIER CONCENTRATION; CONDUCTIVE FILMS; FILM PREPARATION; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; MAGNETRON SPUTTERING; MAGNETRONS; MOLYBDENUM; OXIDE FILMS; ZINC; ZINC OXIDE;

SUBSTRATES;

EID: 72449190612     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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