An optical parametric oscillator as a high-flux source of two-mode light for quantum lithography

New Journal of Physics

Volumn 11, Issue , 2009, Pages

  Cable, Hugo ^a,b   Vyas, Reeta ^c   Singh, Surendra ^c   Dowling, Jonathan P ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c UNIVERSITY OF ARKANSAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBING MATERIALS; ANALYTICAL EXPRESSIONS; CLASSICAL CORRELATION; EFFECTIVE WAVELENGTH; HIGH-GAIN; IN-FIELD; INTERFERENCE PATTERNS; MODE ENTANGLED STATE; MULTI-PHOTON ABSORPTION; MULTIPHOTONS; OPTICAL AMPLIFIER; QUANTUM LITHOGRAPHY; RAYLEIGH;

ELECTRON EMISSION; ETCHING; LIGHT AMPLIFIERS; MULTIPHOTON PROCESSES; OPTICAL PARAMETRIC OSCILLATORS; OPTOELECTRONIC DEVICES; PHOTONS; QUANTUM OPTICS; SCANNING;

PARAMETRIC OSCILLATORS;

EID: 72049119625     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/11/11/113055     Document Type: Article

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