A comparative study of the microstructures and optical properties of Cu- and Ag-doped ZnO thin films

Physica B: Condensed Matter

Volumn 404, Issue 20, 2009, Pages 3645-3649

  Chen, Y ^a   Xu, X L ^b   Zhang, G H ^a   Xue, H ^a   Ma, S Y ^b  

^a PRC   (China)

^b NORTHWEST NORMAL UNIVERSITY   (China)

Author keywords

Direct current co reactive magnetron sputtering; Doped ZnO thin films; Optical properties; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

AG DOPING; BAND GAPS; BAND TAIL; CHEMICAL STATE; COMPARATIVE STUDIES; DIRECT CURRENT; DOPED ZNO; DOPING ELEMENTS; PREFERENTIAL ORIENTATION; REACTIVE MAGNETRON SPUTTERING; SINGLE PHASE; UV VISIBLE SPECTROSCOPY; X-RAY DIFFRACTION SPECTROSCOPY; XPS SPECTRA; XRD; XRD ANALYSIS; ZNO; ZNO FILMS;

COPPER; DIFFRACTION; DOPING (ADDITIVES); MAGNETRONS; METALLIC FILMS; MICROSTRUCTURE; OPTICAL FILMS; OPTICAL PROPERTIES; OXYGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SEMICONDUCTING ZINC COMPOUNDS; SILVER; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS; ZINC; ZINC OXIDE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 71749087043     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2009.06.051     Document Type: Article

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