Lattice site and stability of implanted Ag in ZnO

Physica B: Condensed Matter

Volumn 340-342, Issue , 2003, Pages 240-244

  Rita, E ^a,b   Wahl, U ^a,b   Lopes, A M L ^c   Araujo J P ^d   Correia, J G ^a,b   Alves, E ^a,b   Soares, J C ^b  

^a INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^b CENTRO DE FÍSICA NUCLEAR DA UNIVERSIDADE DE LISBOA   (Portugal)

^c UNIVERSITY OF AVEIRO   (Portugal)

^d UNIVERSITY OF PORTO   (Portugal)

Author keywords

Ag; Emission channeling; Lattice location; ZnO

Indexed keywords

ANNEALING; COMPUTER SIMULATION; CRYSTAL DEFECTS; DIFFUSION; DOPING (ADDITIVES); ION IMPLANTATION; SILVER; SINGLE CRYSTALS;

EMISSION CHANNELLING; LATTICE LOCATION;

ZINC OXIDE;

EID: 0345873483     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2003.09.015     Document Type: Conference Paper

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