Annealing effects on the structural, electrical and H2 sensing properties of transparent ZnO thin films, grown by pulsed laser deposition

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1326-1331

  Stamataki, M ^a,b   Fasaki, I ^b   Tsonos, G ^a   Tsamakis, D ^a   Kompitsas, M ^b  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^b INSTITUTE OF BIOLOGY   (Greece)

Author keywords

Atomic force microscopy (AFM); Hall effect; Heat treatment; Hydrogen; Pulsed laser deposition (PLD); Sensors; Structural properties; Zinc oxide (ZnO)

Indexed keywords

ANNEALING EFFECTS; ATOMIC FORCE MICROSCOPY (AFM); CONSTANT TEMPERATURE; CRYSTALLINITIES; DEPOSITION TECHNIQUE; GAS SENSING CHARACTERISTICS; HYDROGEN CONCENTRATION; OPERATING TEMPERATURE; OXYGEN DEFICIENCY; POST ANNEALING; POSTDEPOSITION HEAT TREATMENT; REACTIVE PULSED LASER DEPOSITION; SENSING PROPERTY; STRUCTURAL INVESTIGATION; TRANSPARENT THIN FILM; ZINC OXIDE THIN FILMS; ZNO; ZNO THIN FILM;

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMS; DEPOSITION; GAS SENSING ELECTRODES; GYRATORS; HALL EFFECT; HYDROGEN; LASERS; MAGNETIC FIELD EFFECTS; OXYGEN; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; SEMICONDUCTING ZINC COMPOUNDS; SENSORS; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 71649103596     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.156     Document Type: Article

References (25)

1. Wang H.T., Kang B.S., Ren F., Tien L.C., Sadik P.W., Norton D.P., Pearton S.J., and Lin J. Appl. Phys. Lett. 86 (2005) 243503
2. Tien L.C., Sadik P.W., Norton D.P., Voss L.F., Pearton S.J., Wang H.T., Kang B.S., Ren F., Jun J., and Lin J. Appl. Phys. Lett. 87 (2005) 222106
3. Lupan O., Chai G., and Chow L. Microelectron. J. 38(12) (2007) 1211
4. Hotovy I., Huran J., Siciliano P., Capone S., Spiess L., and Rehacek V. Sens. Actuators B 103 (2004) 300
5. Pandis Ch., Brilis N., Tsamakis D., Ali H.A., Krishnamoorthy S., and Iliadis A.A. Solid-State Electron. 50 (2006) 1119
6. Brilis N., Romesis P., Tsamakis D., and Kompitsas M. Superlattices Microstruct. 38 (2005) 283
7. Heiland G. Sens. Actuators 2 (1982) 343
8. Suchea M., Christoulakis S., Moschovis K., Katsarakis N., and Kiriakidis G. Thin Solid Films 515 (2006) 551
9. Zhang Z.G., Zhou F., Wei X.Q., Liu M., Sun G., Chen C.S., Xue C.S., Zhuang H.Z., and Man B.Y. Physica E 39 (2007) 253
10. Liu Y.C., Hsieh J.H., and Tung S.K. Thin Solid Films 510 (2006) 32
11. Zhu B.L., Zhao X.Z., Su F.H., Li G.H., Wu X.G., Wu J., Wu R., and Liu J. Physica B 396 (2007) 95
12. Bott B., Jones T.A., and Mann B. Sens. Actuators 5 (1984) 65
13. Mitra P., Chatterjee A.P., and Maiti H.S. Mater. Lett. 35 (1998) 33
14. Chatterjee A.P., Mitra P., and Mukhopadhyay A.K. J. Mater. Sci. 34 (1999) 4225
15. Kobrinsky V., Rothschild A., Lumelsky V., Komem Y., and Lifshitz Y. Appl. Phys. Lett. 93 (2008) 113502
16. Kim, et al. J. Cryst. Growth 262 (2004) 72
17. Sun, et al. Appl. Surf. Sci. 253 (2006) 2066
18. Rusop M., Uma K., Soga T., and Jimbo T. Mat. Sci. Eng. B 127 (2006) 150
19. Serpone N., Lawless D., and Kbairutdinov R. J. Phys. Chem. 99 (1995) 16646
20. Zhao L., Lian J., Liu Y., and Jiang Q. Appl. Surf. Sci. 252 (2006) 8451
21. Zawawi EI L.K., and Abd Alla R.A. Thin Solid Films 339 (1999) 314
22. Jiles D. Introduction to the Electronic Properties of Materials (1994), Chapman and Hall (Chap. 9)
23. Kiriakidis G., Suchea M., Christoulakis S., Horvath P., Kitsopoulos T., and Stoemenos J. Thin Solid Films 515 (2007) 8577
24. Wei X.Q., Zhang Z.G., Liu M., Chen C.S., Sun G., Xue C.S., Zhuang H.Z., and Man B.Y. Mater. Chem. Phys. 101 (2007) 285
25. Sadek A.Z., Choopun S., Wlodarski W., Ippolito S.J., and Kalantar-zadeh K. IEEE Sens. J. 7 (2007) 919