Minimized blurring in stencil lithography using a compliant membrane

TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems

Volumn , Issue , 2009, Pages 1612-1615

  Sidler, K ^a   Villanueva, G ^a   Vazquez Mena, O ^a   Brugger, J ^a  

^a EPFL   (Switzerland)

Author keywords

Blurring; Compliant membrane; Nano apertures; Shadow mask; Stencil lithography

Indexed keywords

FEM SIMULATIONS; NANO-APERTURES; SEM; SHADOW MASK; STENCIL LITHOGRAPHY; UV LITHOGRAPHY;

ACTUATORS; HEAT RADIATION; LITHOGRAPHY; MEMBRANES; MICROSYSTEMS; NANOSENSORS; PIEZOELECTRIC TRANSDUCERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

SOLID-STATE SENSORS;

EID: 71449109584     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2009.5285768     Document Type: Conference Paper

References (8)

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