Structure and optical properties of HfO2 thin films on silicon after rapid thermal annealing

Optical Materials

Volumn 32, Issue 3, 2010, Pages 432-435

  Tan, Tingting ^a   Liu, Zhengtang ^a   Lu, Hongcheng ^a   Liu, Wenting ^a   Tian, Hao ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

HfO2 thin films; Optical properties; Spectroscopic ellipsometry

Indexed keywords

AMORPHOUS FILMS; HAFNIUM OXIDES; OPTICAL PROPERTIES; RAPID THERMAL ANNEALING; REFRACTIVE INDEX; SILICON; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION;

ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; COMPLEX DIELECTRIC FUNCTIONS; EXTINCTION COEFFICIENTS; LORENTZ DISPERSION MODEL; RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING; RAMAN MEASUREMENTS; RAPID THERMAL ANNEALING (RTA);

OPTICAL FILMS;

EID: 71249155180     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2009.10.003     Document Type: Article

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