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Surface and Coatings Technology

Volumn 204, Issue 9-10, 2010, Pages 1503-1508

Etching of carbon-tungsten composite with oxygen plasma

(6) Vesel, A a Mozetic M a Panjan, P a Hauptman, N b Klanjsek Gunde, M b Balat Pichelin, M c

a JO EF STEFAN INSTITUTE (Slovenia)

b NATIONAL INSTITUTE OF CHEMISTRY (Slovenia)

c Centre National de la Recherche Scientifique (France)

Author keywords

AES; AFM; Cleaning; Hydrogenated carbon deposits; ITER; Oxidation; Oxygen plasma; SEM; Tritium retention; Tungsten; XPS

Indexed keywords

AES; AFM; HYDROGENATED CARBON; OXYGEN PLASMA; OXYGEN PLASMAS; SEM; TRITIUM RETENTION; XPS;

AMORPHOUS CARBON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; AUGER ELECTRON SPECTROSCOPY; DEPOSITS; DEPTH PROFILING; ELECTRIC DISCHARGES; ETCHING; EXPERIMENTAL REACTORS; GRAPHITE; HYDROGENATION; IONIZATION OF GASES; OXIDATION; OXYGEN; PLASMA APPLICATIONS; PLASMAS; SCANNING ELECTRON MICROSCOPY; TRITIUM; TUNGSTEN; TUNGSTEN CARBIDE; TUNGSTEN DEPOSITS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 71049181405 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.09.082 Document Type: Article

Times cited : (45)

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