Kinetics of a transient silicide during the reaction of Ni thin film with (100)Si

Applied Physics Letters

Volumn 95, Issue 18, 2009, Pages

  Mangelinck, Dominique ^a,b   Hoummada, Khalid ^c   Blum, Ivan ^c  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b CNRS   (France)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; SILICIDES; X RAY DIFFRACTION;

IN-SITU MEASUREMENT; NI THIN FILMS; PHASE FORMATIONS; POSSIBLE MECHANISMS; TRANSIENT PHASE;

REACTION KINETICS;

EID: 71049148070     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3257732     Document Type: Article

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