Improvement of depth resolution in XPS analysis of fluorinated layer using C 60 ion sputtering

Applied Surface Science

Volumn 256, Issue 5, 2009, Pages 1560-1565

  Nobuta, Takuya ^a   Ogawa, Toshio ^b  

^a Nitto Analytical Techno Center Co Ltd   (Japan)

^b KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

C 60 ion; Depth profile XPS analysis; Depth resolution; Fluorinated layer; Sputtering rate

Indexed keywords

CROSSLINKING; IONS; SPUTTERING; SURFACE REACTIONS;

CARBON-RICH LAYERS; CROSSLINKING REACTION; DEPTH RESOLUTION; FLUORINATED LAYER; LAYER THICKNESS; SPUTTERING RATE; SURFACE SMOOTHNESS; XPS ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70849124301     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.09.022     Document Type: Article

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