Surface depth analysis for fluorinated block copolymer films by X-ray photoelectron spectroscopy using C60 cluster ion beam

Applied Surface Science

Volumn 254, Issue 17, 2008, Pages 5435-5438

  Tanaka, Keiji ^a   Sanada, Noriaki ^b   Hikita, Masaya ^c,d   Nakamura, Tetsuya ^c   Kajiyama, Tisato ^a   Takahara, Atsushi ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b ULVAC PHI Inc   (Japan)

^c Chemical Innovation Institute (JCII)   (Japan)

^d NOF Corporation   (Japan)

Author keywords

C60 cluster ion beam; DSIMS; Fluorinated block copolymer; XPS

Indexed keywords

ION BEAMS; ION BOMBARDMENT; POLYMER FILMS; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CLUSTER ION BEAMS; FLUORINATED BLOCK COPOLYMER;

BLOCK COPOLYMERS;

EID: 43849095163     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.02.089     Document Type: Article

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