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Volumn 4, Issue 2, 1999, Pages 97-111

Plasma surface modification of fluoropolymers studied by ToF-SIMS

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; ADHESION; FLUOROCARBONS; HYDROCARBONS; PLASMA APPLICATIONS; PLASTIC FILMS; SECONDARY ION MASS SPECTROMETRY; SURFACE CHEMISTRY; SURFACE STRUCTURE; SURFACE TENSION; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0033298443     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1021892707963     Document Type: Article
Times cited : (7)

References (20)
  • 13
    • 0343402774 scopus 로고
    • W. Kern, Editor, Noyes Publications, Park Ridge, New Jersey Chapter 1
    • W. Kern, in Handbook of Semiconductor Wafer Cleaning Technology, W. Kern, Editor, Noyes Publications, Park Ridge, New Jersey (1993) Chapter 1; W. Storm, W. Vandervorst, M. H. Heyns, C. Poleunis and P. Bertrand, CleanRoom Internat., February, S10 (1996).
    • (1993) Handbook of Semiconductor Wafer Cleaning Technology
    • Kern, W.1
  • 17
    • 0343402773 scopus 로고    scopus 로고
    • Technical Information Bulletins H-04310 and H-04311
    • DuPont Electronics, Technical Information Bulletins H-04310 and H-04311.
    • DuPont Electronics
  • 20
    • 0004011203 scopus 로고    scopus 로고
    • R. d'Agostino, F. Fracassi and P. Favia, eds., Kluwer Academic Publishers, Dordrecht, p
    • J. E. Klemberg-Sapieha, in Plasma Processing of Polymers, R. d'Agostino, F. Fracassi and P. Favia, eds., Kluwer Academic Publishers, Dordrecht, 1997, p.
    • (1997) Plasma Processing of Polymers
    • Klemberg-Sapieha, J.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.