Light-extraction enhancement of red AlGaInP light-emitting diodes with antireflective subwavelength structures

Optics Express

Volumn 17, Issue 23, 2009, Pages 20991-20997

  Song, Y M ^a   Choi, E S ^a   Yu, J S ^b   Lee, Y T ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

GALLIUM ALLOYS; SILVER; SLOW WAVE STRUCTURES;

DRY ETCH PROCESS; EMISSION WAVELENGTH; FAR-FIELD PATTERNS; INTERNAL REFLECTIONS; LIGHT OUTPUT POWER; RIGOROUS COUPLED WAVE ANALYSIS; SUBWAVELENGTH STRUCTURES; THERMAL DEWETTING;

LIGHT EMITTING DIODES;

EID: 70749117459     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.020991     Document Type: Article

References (17)

1. P. Lalanne, and G. M. Morris, "Antireflection behavior of silicon subwavelength periodic structures for visible light," Nanotechnology 8(2), 53-56 (1997).
2. 2) filins," Opt. Lett. 26(21), 1642-1644 (2001).
3. Y. Kanamori, M. Ishimori, and K. Hane, "High efficient light-emitting diodes with antireflection subwavelength gratings," IEEE Photon. Technol. Lett. 14(8), 1064-1066 (2002).
4. M. Ishimori, Y. Kanamori, M. Sasaki, and K. Hane, "Subwavelength antireflection gratings for light emitting diodes and photodiodes fabricated by fast atom beam etching," Jpn. J. Appl. Phys. 41(Part 1, No. 6B), 4346-4349 (2002).
5. Z. Yu, H. Gao, W. Wu, H. Ge, and S. Y. Chou, "Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff," J. Vac. Sci. Technol. B 21(6), 2874-2877 (2003).
6. Y. M. Song, S. Y. Bae, J. S. Yu, and Y. T. Lee, "Closely packed and aspect-ratio-controlled antireflection subwavelength gratings on GaAs using a lenslike shape transfer," Opt. Lett. 34(11), 1702-1704 (2009).
7. Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C. H. Hsu, Y. H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, "Improved broadband and quasi-omnidirectional antireflection properties with biomimetic silicon nanostructures," Nat. Nanotechnol. 2(12), 770-774 (2007).
8. P. Yu, C.-H. Chang, C.-H. Chiu, C.-S. Yang, J.-C. Yu, H.-C. Kuo, S.-H. Hsu, and Y.-C. Chang, "Efficiency enhancement of GaAs photovoltaics employing antireflective indium tin oxide nanocoluins," Adv. Mater. 21(16), 1618-1621 (2009).
9. T. Lohmüller, M. Helgert, M. Sundermann, R. Brunner, and J. P. Spatz, "Biomimetic interfaces for high-performance optics in the deep-UV light range," Nano Lett. 8(5), 1429-1433 (2008).
10. Y. Kojima, and T. Kato, "Nanoparticle formation in Au thin films by electron-beain-induced dewetting," Nanotechnology 19(25), 255605 (2008).
11. J.-M. Lee, and B.-I. Kim, "Thermal dewetting of Pt thin film: Etch-masks for the fabrication of semiconductor nanostructures," Mater. Sci. Eng. A 449-451, 769-773 (2007).
12. S. Wang, X. Z. Yu, and H. T. Fan, "Simple lithographic approach for subwavelength structure antireflection," Appl. Phys. Lett. 91(6), 061105 (2007).
13. M. G. Moharain, and T. K. Gaylord, "Rigorous coupled-wave analysis of planar-grating diffraction," J. Opt. Soc. Am. 71 (7), 811-818 (1981).
14. M. G. Moharam, and T. K. Gaylord, "Three-dimensional vector coupled-wave analysis of planar-grating diffraction," J. Opt. Soc. Am. 73(9), 1105-1112 (1983).
15. S. A. Boden, and D. M. Bagnall, "Tunable reflection minima of nanostructured antireflective surfaces," Appl. Phys. Lett. 93(13), 133108 (2008).
16. E. Hecht, Optic, 4th ed.(Addison Wesley, 2002), Chap. 10.
17. E. S. Kooij, E. A. M. Brouwer, H. Wormeester, and B. Poelsema, "Ionic strength mediated self-organization of gold nanocrystals: An AFM study," Langmuir 18(20), 7677-7682 (2002).