Electrochemical CV-profiling of GaN

Physica Status Solidi C: Conferences

Volumn 1, Issue 10, 2004, Pages 2491-2494

  Wolff, T ^a   Rapp, M ^a   Rotter, T ^b  

^a Ingenieurbüro WEP ^*  (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ELECTROLYTES; ETCHING; METALLORGANIC VAPOR PHASE EPITAXY; NITRIDES; OXIDATION; SCANNING ELECTRON MICROSCOPY; SURFACES; WETTING;

ACCEPTORS; CYCLIC OXIDATION; DONORS; SEMICONDUCTOR SURFACES;

GALLIUM NITRIDE;

EID: 7044222193     PISSN: 16101634     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/pssc.200405079     Document Type: Conference Paper

References (8)

1. T. Ambridge and M. M. Faktor, Inst. Phys. Conf. Ser. 24, 320 (1975).
2. P. Blood, Semicond. Sci. Technol. 1, 7 (1986).
3. C. Youtsey, L. T. Romano, and I. Adesida, Appl. Phys. Lett. 73, 797 (1998).
4. M. S. Minsky, M. White, and E. L. Hu, Appl. Phys. Lett. 68, 1531 (1996).
5. J. E. Borton, C. Cai, M. I. Nathan, P. Chow, J. M. Van Howe, A. Wowchakand, and H. Morkoc, Appl. Phys. Lett. 77, 1227 (2000).
6. T. Wolff, M. Rapp, and T. Rotter, phys. stat. sol. (a) 201, 2067 (2004).
7. T. Rotter, D. Mistele, J. Stemmer, F. Fedler, J. Aderhold, J. Graul, V. Schwegler, C. Kirchner, M. Kamp, and M. Heuken, Appl. Phys. Lett. 76, 3923 (2000).
8. J. W. Huang, T. F. Kuech, H. Lu, and I. Bhat, Appl. Phys. Lett. 68, 2392 (1996).