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Materials Letters

Volumn 64, Issue 1, 2010, Pages 83-85

Deposition of unhydrogenated amorphous carbon films by sublimation of C60 fullerene in electron beam excited plasma

(2) Vaez Taghavi, Hamed a Hirata, Atsushi a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Amorphous carbon; Film; Fullerene; Hardness; Plasma; Sublimation

Indexed keywords

A-CARBON; ACTIVE SPECIES; ARGON PLASMAS; AVERAGE SURFACE ROUGHNESS; CARBON SPECIES; ELECTRON BEAM EXCITED PLASMA; FULLERENE CLUSTERS; FULLERENE FILMS; HARDNESS MEASUREMENT; HEATING UP; NANOINDENTATION TECHNIQUES; RAMAN SPECTROSCOPIC;

AMORPHOUS FILMS; ARGON; CARBON CLUSTERS; CARBON FILMS; CRYSTAL MICROSTRUCTURE; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIFFRACTION; ELECTRON BEAMS; FULLERENES; HARDNESS; HOLOGRAPHIC INTERFEROMETRY; PLASMAS; RAMAN SPECTROSCOPY; SPECTROSCOPIC ANALYSIS; SUBLIMATION; SURFACE ROUGHNESS;

AMORPHOUS CARBON;

EID: 70350745412 PISSN: 0167577X EISSN: None Source Type: Journal
DOI: 10.1016/j.matlet.2009.08.063 Document Type: Article

Times cited : (1)

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