Ion irradiation hardening of C60 thin films

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 201-204

  Foerster, C E ^a   Lepienski, C M ^b   Serbena, F C ^a   Zawislak, F C ^c  

^a STATE UNIVERSITY OF PONTA GROSSA   (Brazil)

^b FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

^c FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ELASTIC MODULI; ELECTRONIC PROPERTIES; FULLERENES; HARDENING; ION IMPLANTATION; IRRADIATION; NANOTECHNOLOGY; NUCLEAR ENERGY; SILICON; SUBSTRATES;

ELECTRONIC ENERGY; ION IRRADIATION; NANOINDENTATION TECHNIQUE; SILICON SUBSTRATE;

THIN FILMS;

EID: 0032663891     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01258-9     Document Type: Article

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