Optical properties of porous silicon coated with ultrathin gold film by RF-magnetron sputtering

Journal of the European Ceramic Society

Volumn 30, Issue 2, 2010, Pages 459-463

  Hong, Chanseok ^a   Kim, Hohyeong ^a   Park, Sunghoon ^a   Lee, Chongmu ^a  

^a Inha University   (South Korea)

Author keywords

Annealing; Gold; Photoluminescence; Porous silicon; Transmittance; X ray photoelectron spectrometry

Indexed keywords

ANNEALING TEMPERATURES; AU FILM; ELECTROCHEMICAL ANODIZATIONS; FTIR; GOLD FILM; INHIBITING EFFECT; OPTICAL TRANSMITTANCE; P-TYPE; PL INTENSITY; POST ANNEALING; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; TRANSMITTANCE; ULTRA-THIN; X-RAY PHOTOELECTRON SPECTROMETRY; X-RAY PHOTOELECTRONS; XPS; XPS ANALYSIS;

ANNEALING; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GOLD DEPOSITS; METALLIC FILMS; OPTICAL PROPERTIES; OXIDATION; PASSIVATION; PHOTOIONIZATION; PHOTOLUMINESCENCE; PHOTOLUMINESCENCE SPECTROSCOPY; PHOTONS; POROUS SILICON; SPECTROMETRY; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

GOLD;

EID: 70350726227     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2009.08.010     Document Type: Article

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