SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 92, Issue , 1996, Pages 57-60

Study of Ag thin films deposited on porous silicon

(5) Young, T F a Liu, J F a Wu, C C a Fu, G H a Chen, C S a

a NATIONAL SUN YAT SEN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; METALLIC FILMS; OXIDATION; PHOTOLUMINESCENCE; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SILVER; SURFACE STRUCTURE; X RAY DIFFRACTION;

JUNCTION RESISTORS; RANDOM FRACTAL SURFACE STRUCTURE; RANDOM TUNNELING JUNCTION NETWORK MODEL; TUNNELING EFFECT;

THIN FILMS;

EID: 0030562433 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(95)00202-2 Document Type: Article

Times cited : (19)

References (11)

1
- 0141775174
- L.T. Canham, Appl. Phys. Lett. 57 (1990) 1046.
- (1990) Appl. Phys. Lett. , vol.57 , pp. 1046
- Canham, L.T.¹

2
- 0026205766
- A. Bsiesy, J.C. Vial, F. Gaspard, R. Herino, M. Ligeon, F. Muller, R. Romestain, A. Wasiela, A. Halimaoui and G. Bomchil, Surf. Sci. 254 (1991) 195:
- (1991) Surf. Sci. , vol.254 , pp. 195
- Bsiesy, A.¹ Vial, J.C.² Gaspard, F.³ Herino, R.⁴ Ligeon, M.⁵ Muller, F.⁶ Romestain, R.⁷ Wasiela, A.⁸ Halimaoui, A.⁹ Bomchil, G.¹⁰

3
- 21544439874
- F. Namavar, H.P. Maruska and N.M. Kalkhoran, Appl. Phys. Lett. 60 (1992) 2514.
- (1992) Appl. Phys. Lett. , vol.60 , pp. 2514
- Namavar, F.¹ Maruska, H.P.² Kalkhoran, N.M.³

4
- 21544478504
- H.P. Maruska, F. Namavar and N.M. Kalkhoran, Appl. Phys. Lett. 61 (1992) 1338.
- (1992) Appl. Phys. Lett. , vol.61 , pp. 1338
- Maruska, H.P.¹ Namavar, F.² Kalkhoran, N.M.³

5
- 0027683921
- G.X. Ye, J.S. Wang, Y.Q. Xu and Q.R. Zhang, Solid State Commun. 88 (1993) 275.
- (1993) Solid State Commun. , vol.88 , pp. 275
- Ye, G.X.¹ Wang, J.S.² Xu, Y.Q.³ Zhang, Q.R.⁴

6
- 0028387892
- F.L. Zhang, X.Y. Hou, M. Yang, D.M. Huang and X. Wang, Acta Phys. Sinica 43 (1994) 499.
- (1994) Acta Phys. Sinica , vol.43 , pp. 499
- Zhang, F.L.¹ Hou, X.Y.² Yang, M.³ Huang, D.M.⁴ Wang, X.⁵

7
- 84929177658
- Y.J. Chabal, G.S. Higashi, K. Raghavachari and V.A. Burrows, J. Vac. Sci. Technol. A 7 (1989) 2104.
- (1989) J. Vac. Sci. Technol. A , vol.7 , pp. 2104
- Chabal, Y.J.¹ Higashi, G.S.² Raghavachari, K.³ Burrows, V.A.⁴

8
- 0027574561
- Y.H. Seo, H.-J. Lee, H.I. Jeon, D.H. Oh, K.S. Nahm, Y.H. Lee, E.-K. Sun, H.J. Lee and Y.G. Kwang, Appl. Phys. Lett. 62 (1993) 1812.
- (1993) Appl. Phys. Lett. , vol.62 , pp. 1812
- Seo, Y.H.¹ Lee, H.-J.² Jeon, H.I.³ Oh, D.H.⁴ Nahm, K.S.⁵ Lee, Y.H.⁶ Sun, E.-K.⁷ Lee, H.J.⁸ Kwang, Y.G.⁹

9
- 33748260414
- V.P. Koch, T. Muschik, A. Kux, B.K. Meyer and F. Koch, Appl. Phys. Lett. 61 (1992) 943.
- (1992) Appl. Phys. Lett. , vol.61 , pp. 943
- Koch, V.P.¹ Muschik, T.² Kux, A.³ Meyer, B.K.⁴ Koch, F.⁵

10
- 0000065816
- S. Shih, K.H. Jung, D.L. Kwong, M. Kovar and J.M. White, Appl. Phys. Lett. 62 (1993) 1780.
- (1993) Appl. Phys. Lett. , vol.62 , pp. 1780
- Shih, S.¹ Jung, K.H.² Kwong, D.L.³ Kovar, M.⁴ White, J.M.⁵

11
- 0040238170
- R. Sabet-Dariani and D. Haneman, J. Appl. Phys. 76 (1994) 1346.
- (1994) J. Appl. Phys. , vol.76 , pp. 1346
- Sabet-Dariani, R.¹ Haneman, D.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.