Factors affecting growth defect formation in cathodic arc evaporated coatings

Surface and Coatings Technology

Volumn 82, Issue 3, 1996, Pages 334-343

  Aharonov, Robert R ^a   Chhowalla, Manish ^a   Dhar, Suranjeeta ^a   Fontana, Raymond P ^a  

^a Multi Arc Inc   (United States)

Author keywords

Cathodic arc; Growth defects; Macroparticles; Pulsed bias

Indexed keywords

CATHODES; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; ELECTROPLATING; EVAPORATION; FILM GROWTH; HARD FACING; SPUTTERING; SURFACES; THIN FILMS;

BIAS VOLTAGE CHARACTERISTICS; CATHODIC ARC EVAPORATED COATINGS; DEFECT FORMATION; MACROPARTICLES; PULSED BIAS;

COATINGS;

EID: 0030212511     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02773-4     Document Type: Article

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