Gap micro-lithography for chalcogenide micro-lens array fabrication

Chalcogenide Letters

Volumn 5, Issue 4, 2008, Pages 61-64

  Manevich, M ^a   Klebanov, M ^b   Lyubin, V ^b   Varshal, J ^a   Broder, J ^a   Eisenberg, N P ^a  

^a Lev Institute JCT   (Israel)

^b BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

Chalcogenide glassy film; Chalcogenide photoresist; Gap micro lithography; Micro lens array

Indexed keywords

EID: 70350364499     PISSN: 15848663     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. S. A. Telenkov, B. S. Tanenbaum, D. M. Goodman, J. S. Nelson, T. E. Milner, IEEE J. of Selected Topics in Quantum electronics 5, 1193 (1999).
2. E. Higurashi, R. Sawada, T. Ito, J. Micromech. Microeng. 11, 140 (2001).
3. T. J. Suleskiand, R. D. TeKolste, J. Lightwave Technol. 23, 633 (2005).
4. S. Sinzinger, J. Jahns, "Refractive micro-optics", in Micro-optics (2nd Edition), 93-131 (2005), Willey-VCH Verlag.
5. S. Noach, M. Manevich, M. Klebanov, V. Lyubin, N.P. Eisenberg, SPIE Proceedings "Gradient Index, Miniature and Diffractive Optical Systems", 3778, 158 (1999).
6. V. Lyubin, M. Klebanov, I. Bar, S. Rosenwaks, N. P. Eisenberg, M. Manevich, J. Vac. Sci. Technol. B 15, 823 (1997).
7. N. P. Eisenberg, M. Klebanov, V. Lyubin, M. Manevich, S. Noach, J. Optoelectron. Adv. Mater. 2, 147 (2000).
8. N. P. Eisenberg, M. Manevich, A. Arsh, M. Klebanov, V. Lyubin, J. Optoelectron. Adv. Mater. 4(2), 405 (2002).
9. N. P. Eisenberg, M. Manevich, S. Noach, M. Klebanov, V. Lyubin, Materials Science in Semiconductor Processing 3, 443 (2000).
10. N. P. Eisenberg, M. Manevich, A. Arsh, M. Klebanov, V. Lyubin, J. Optoelectron. Adv. Mater. 7(5), 2275 (2005).
11. A. Arsh, M. Klebanov, V. Lyubin, L. Shapiro, A. Feigel, M. Veinger, B. Sfez, Optical Materials 26, 301 (2004).