메뉴 건너뛰기




Volumn 5515, Issue , 2004, Pages 187-194

High aspect ratio grating fabrication by imprint lithography

Author keywords

Aspect ratio; Grating; Imprint lithography; Optical element; Optical switch; Quarter wave plate

Indexed keywords

IMPRINT LITHOGRAPHY; NANO FABRICATION; NANO OPTICAL ELEMENTS; QUARTER WAVE PLATE;

EID: 13244284659     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.560249     Document Type: Conference Paper
Times cited : (8)

References (7)
  • 1
    • 0004239743 scopus 로고    scopus 로고
    • Taylor & Francis, London
    • H. Herzing, Micro-optics, Taylor & Francis, London, 1997.
    • (1997) Micro-optics
    • Herzing, H.1
  • 4
    • 0942300052 scopus 로고    scopus 로고
    • Defect analysis in thermal nano imprint lithography
    • Y. Hirai, S. Yoshida, N. Takagi,: 'Defect analysis in thermal nano imprint lithography', J. Vac. Sci. Technol. B21, pp.2765-2770 (2003).
    • (2003) J. Vac. Sci. Technol. , vol.B21 , pp. 2765-2770
    • Hirai, Y.1    Yoshida, S.2    Takagi, N.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.