Oxide etch rate estimation using plasma impedance monitoring

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5755, Issue , 2005, Pages 59-68

  Tsunami, Daniel ^a   McNames, James ^a   Whitefield, Bruce ^b   Rudolph, Paul ^b   Zola, Jeff ^b  

^a PORTLAND STATE UNIVERSITY   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

Etch rate estimation; Plasma impedance monitoring

Indexed keywords

DATA COLLECTION; ETCH RATE ESTIMATION; PLASMA IMPEDENCE MONITORING; PROCESS CONTROLLER;

ELECTRIC IMPEDANCE; OPTIMIZATION; OXIDES; PLASMAS; PROCESS CONTROL; SILICON WAFERS; STATISTICAL METHODS;

ETCHING;

EID: 25144508048     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599997     Document Type: Conference Paper

References (3)

1. C. Garvin and J. W. Grizzle. "Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool." Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films. 18(4). pp. 1297-1302. 2000.
2. 2 etch rates, impedance analysis, and discharge emissions." Electrochemical and Solid-State Letters 3. pp. 99-102. February 2000.
3. 4 plasma using neural networks." Thin Solid Films 426, pp. 8-15, February 2003.