Electrostatic properties of silane monolayers in an electrolytic environment

Journal of Physical Chemistry C

Volumn 113, Issue 38, 2009, Pages 16802-16806

  Halpern, E ^a   Khamaisi, B ^a   Shaya, O ^a   Shalev, G ^b   Levy, I ^b   Rosenwaks, Y ^a  

^a TEL AVIV UNIVERSITY   (Israel)

^b INTEL CORPORATION   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

3-AMINOPROPYL TRIMETHOXYSILANE; CAPACITANCE VOLTAGE MEASUREMENTS; DRY CONDITION; ELECTROSTATIC PROPERTIES; ELECTROSTATIC SCREENING; FLAT BAND; INTERFACE STATE; ORDER OF MAGNITUDE; SELF ASSEMBLY PROCESS; SELF-ASSEMBLED; SILANE MONOLAYERS; SURFACE ACTIVATION; UV RADIATION;

ELECTROLYSIS; ELECTROLYTES; ELECTROLYTIC CLEANING; ELECTROSTATICS; MONOLAYERS; SELF ASSEMBLY; SILANES; SILICON OXIDES; ULTRAVIOLET RADIATION;

SURFACE CLEANING;

EID: 70349862863     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp904614c     Document Type: Article

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