Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications

Applied Optics

Volumn 48, Issue 26, 2009, Pages 4932-4941

  Windt, David L ^a   Bellotti, Jeffrey A ^a  

^a Reflective X ray Optics LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM COATINGS; AMORPHOUS FILMS; AMORPHOUS MATERIALS; ELECTRON MICROSCOPY; EXTREME ULTRAVIOLET LITHOGRAPHY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MULTILAYERS; POLYCRYSTALLINE MATERIALS; REACTIVE SPUTTERING; REFLECTION; REFLECTIVE COATINGS; SILICON CARBIDE; TRANSMISSION ELECTRON MICROSCOPY;

ALUMINUM (AL); EUV REFLECTANCE; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; INTERFACE WIDTHS; PERIODIC MULTILAYERS; POLYCRYSTALLINE; SILICON CARBIDES (SIC);

MULTILAYER FILMS;

EID: 70349492241     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.004932     Document Type: Article

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