Oxidation of sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O films during thermal annealing in flowing air

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Musil, Jindřich ^a   Zeman, Petr ^a   Jirout, Michal ^a   Šašek, Martin ^a   Čerstvý, Radomir ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Films; Magnetron sputtering; Oxidation resistance; Thermogravimetry; Zr Cu O films; ZrO2 films

Indexed keywords

CU CONTENT; HIGH TEMPERATURE; OXIDATION BEHAVIORS; POST-DEPOSITION; REVERSIBLE PROCESS; THERMAL-ANNEALING; THERMOGRAVIMETRY; UNBALANCED MAGNETRON; XRD; ZR-CU-O FILMS; ZRO2 FILMS;

ANNEALING; COPPER OXIDES; MAGNETRONS; MECHANICAL PROPERTIES; OXIDATION; OXIDATION RESISTANCE; THERMOGRAVIMETRIC ANALYSIS; ZIRCONIUM; ZIRCONIUM ALLOYS;

COPPER;

EID: 70349422292     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731401     Document Type: Conference Paper

References (11)

1. H. Zeman, J. Musil, P. Zeman, J. Vac. Sci. Technol. 2004, A22, 646.
2. J. Musil, R. Daniel, P. Zeman, O. Takai, Thin Solid Films 2005, 478, 238.
3. J. Musil, P. Dohnal, P. Zeman, J. Vac. Sci. Technol. 2005, B23, 1568.
4. J. Musil, R. Daniel, J. Soldan, P. Zeman, Surf. Coat. Technol. 2006, 200, 3886.
5. P. Zeman, J. Musil, R. Daniel, Surf. Coat. Technol. 2006, 200, 4091.
6. J. Musil, P. Zeman, Solid State Phenom. 2006, 31-36.
7. J. Musil, P. Zeman, P. Dohnal, R. Čerstvý, "Ti-Si-N nanocomposite films with high content of Si", 10th International Conference on Plasma Surface Engineering (PSE2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany, paper no. po3012.
8. H. Holleck, J. Vac. Sci. Technol. 1986, A4, 2661.
9. Y. Zhu, K. Mimura, M. Isshiki, Oxid. Met. 2004, 62, 207.
10. T. Narushima, M. Kato, S. Murase, C. Ouichi, Y. Iguchi, J Am. Ceram. Soc. 2002, 85, 2049.
11. J. D. Wilcock, D. S. Campbell, Thin Solid Films 1969, 3, 3.