Synthesis of TiO2 films by ICP-assisted DC magnetron sputtering

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 643-647

  Park, Bohwan ^a   Jung, Dong Ha ^a   Lee, Girak ^a   Lee, Jung Joong ^a   Joo, Jung Hoon ^b  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

Anatase structure; Inductively coupled plasma (ICP); TiO2 films

Indexed keywords

CRYSTALLINE MATERIALS; MAGNETRON SPUTTERING; PARTIAL PRESSURE; TITANIUM COMPOUNDS;

ION DENSITY;

TITANIUM DIOXIDE;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042328121     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00354-2     Document Type: Article

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