SCOPUS 정보 검색 플랫폼

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

High temperature resistant coatings deposited by combined magnetron sputtering and ion implantation

(6) Grigore, Eduard a Chivu, Mioara b Coman, Cristian b Li, Xiao c Dong, Hanshan c Ruset, Cristian a

a NATIONAL INSTITUTE FOR LASER (Romania)

b Metallurgical Research Institute (Romania)

c UNIVERSITY OF BIRMINGHAM (United Kingdom)

Author keywords

Films; Ion implantation; Magnetron; Oxidation

Indexed keywords

COMBINED MAGNETRON SPUTTERING; COMPLEX TARGETS; GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRIES; HIGH-TEMPERATURE RESISTANT; MICROHARDNESS MEASUREMENT; MULTI-PHASE STRUCTURES; OXIDATION TESTS; SEM; TI-SI-C SYSTEMS;

GLOW DISCHARGES; HEATING; ION BOMBARDMENT; ION IMPLANTATION; MAGNETRONS; MICROHARDNESS; OPTICAL EMISSION SPECTROSCOPY; OPTICAL MICROSCOPY; OXIDATION; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; STRUCTURAL ANALYSIS; TARGETS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

HARD COATINGS;

EID: 70349416597 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200731412 Document Type: Conference Paper

Times cited : (1)

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