Dependence of the physical properties of GaZnO/polyethersulfone on the Ar Gas flow rate during sputtering deposition process

Journal of the Korean Physical Society

Volumn 55, Issue 2, 2009, Pages 585-589

  Seong, Junje ^a   Kim, Deuk Young ^a   Sejoon, L E E ^a  

^a Dongguk University   (South Korea)

Author keywords

Electrical resistivity; Ga doped zno; Optical transmission; Transparent conductive oxide

Indexed keywords

EID: 70349323071     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.55.585     Document Type: Article

References (22)

1. H. Yamauchi, M. Iizuka and K. Kudo, Jpn. J. Appl. Phys. 46, 2678 (2007).
2. T. Yatsui, S. Sangu, K. Kobayashi, T. Kawazoe, M. Ohtsu, J. Yoo and G.-C. Yi, Appl. Phys. Lett. 94, 083113 (2009).
3. J. J. Berry, D. S. Ginley and P. E. Burrows, Appl. Phys. Lett. 92, 193304 (2008).
4. M.-W. Ahn, K.-S. Park, J.-H. Heo, J.-G. Park, D.-W. Kim, K. J. Choi, J.-H. Lee and S.-H. Hong, Appl. Phys. Lett. 93, 263103 (2008).
5. J. Owen, M. S. Son, K.-H. Yoo, B. D. Ahn and S. Y. Lee, Appl. Phys. Lett. 90, 033512 (2007).
6. H. S. Bae and S. Im, Thin Solid Films 469, 75 (2004).
7. C. Kittel, Introduction to Solid State Physics, 8th ed. (Wiley, New York, 2005).
8. S. H. Lee, Y. M. Yu, S. Y. Jeong and T. H. Kim, J. Korean Phys. Soc. 51, S79 (2007).
9. J. C. Lee, Y. D. Kim, J. H. Lee, Y. S. Kim, C. S. Son and P. K. Song, J. Korean Phys. Soc. 53, 416 (2008).
10. J. Seong, D. Y. Kim and S. Lee, J. Korean Phys. Soc. 54, 2396 (2009).
11. Y. C. Lin, J. Y. Li and W. T. Yen, Appl. Surf. Sci. 254, 3262 (2008).
12. H. Ito, W. Oka, H. Goto and H. Umeda, Jpn. J. Appl. Phys. 45, 4325 (2006).
13. D. S. Kim, S. Lee, C. Min, H.-M. Kim, Sh. U. Yuldashev, T. W. Kang, D. Y. Kim and T. W. Kim, Jpn. J. Appl. Phys. 42, 7217 (2003).
14. K. S. S. Harsha, Principles of Physical Vapor Deposition of Thin Films (Elsevier, London, 2006).
15. O. Nakagawara, Y. Kishimoto, H. Seto, Y. Koshido, Y. Yoshino and T. Makino, Appl. Phys. Lett. 89, 091904 (2006).
16. R. A. Powell and S. Rossnagel, PVD for Microelectronics: Sputter Deposition Applied to Semiconductor Manufacturing (Academic Press, Boston, 1999).
17. J. C. Manifacier, J. Gasiot and J. P. Fillard, J. Phys. E: Sci. Instrum. 9, 1002 (1976).
18. C. H. Peng and S. B. Desu, J. Am. Ceram. Soc. 77, 929 (1994).
19. X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang, C. Cheng and H. Ma, J. Crystal Growth 274, 474 (2005).
20. J. A. Sans, J. F. Sanchez-Royo and A. Segura, Superlat- tices. Microst. 43, 362 (2008).
21. A. S. Gonçalves, S. Antonio, M. Lima, M. R. Davolos, S. G. Antônio and C. O. Paiva-Santos, J. Solid State Chem. 179, 1330 (2006).
22. T. Omata, N. Ueda and K. Ueda, Appl. Phys. Lett. 64, 1077 (1994).