Modeling and optimization of the deposition of shape memory Polymers for information storage applications

IEEE Transactions on Semiconductor Manufacturing

Volumn 22, Issue 3, 2009, Pages 409-416

  Wornyo, Edem ^a,b   May, Gary S ^b   Gall, Ken ^c  

^a IBM   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^c Georgia Institute of Technology   (United States)

Author keywords

Genetic algorithms; MEMS; Nanotechnology; Neural networks; Optimization; Shape memory polymers

Indexed keywords

BISPHENOL A; CENTRAL COMPOSITE; DIETHYLENE GLYCOL DIMETHACRYLATE; DIMETHACRYLATES; FULL FACTORIAL EXPERIMENT; HIGH-CAPACITY; INFORMATION STORAGE APPLICATIONS; INPUT PARAMETER; MODELING AND OPTIMIZATION; NEURAL NETWORK MODEL; NITROGEN FLOW RATES; OUTPUT RESPONSE; PROCESS MODELING; PROCESSING CONDITION; SHAPE MEMORY POLYMERS; SPIN SPEED; TWO-MATERIALS;

EXPERIMENTS; GENETIC ALGORITHMS; GLYCOLS; MEMS; MICROELECTROMECHANICAL DEVICES; NANOTECHNOLOGY; NEURAL NETWORKS; OPTIMIZATION; PHENOLS; REGRESSION ANALYSIS; SHAPE MEMORY EFFECT; SPIN DYNAMICS;

POLYMERS;

EID: 70349311112     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2009.2024902     Document Type: Article

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