Recipe synthesis for PECVD SiO2 films using neural networks and genetic algorithms

Proceedings - Electronic Components and Technology Conference

Volumn , Issue , 1996, Pages 855-860

  Han, Seung Soo ^a   May, Gary S ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKPROPAGATION; COMPUTER SIMULATION; ETCHING; GENETIC ALGORITHMS; IMPURITIES; NEURAL NETWORKS; PERFORMANCE; PERMITTIVITY; PLASMA APPLICATIONS; REFRACTIVE INDEX; RESIDUAL STRESSES; SILICA;

CENTRAL COMPOSITE EXPERIMENTAL DESIGN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANOL CONCENTRATION; UNIFORMITY; WATER CONCENTRATION; WET ETCH RATE;

CHEMICAL VAPOR DEPOSITION;

EID: 0029709228     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)