-
1
-
-
33847748948
-
Ultra-thin-body fully depleted SOI metal source/drain n-MOSFETs and ITRS low-standby-power targets through 2018
-
D. Connelly, P. Clifton, C. Faulkner, and D. E. Grupp, "Ultra-thin-body fully depleted SOI metal source/drain n-MOSFETs and ITRS low-standby-power targets through 2018," in IEDM Tech. Dig., 2005, pp. 972-975.
-
(2005)
IEDM Tech. Dig
, pp. 972-975
-
-
Connelly, D.1
Clifton, P.2
Faulkner, C.3
Grupp, D.E.4
-
2
-
-
33847737772
-
A new compact model for junctions in advanced CMOS technologies
-
A. J. Scholten, G. D. J. Smit, M. Durand, R. van Langevelde, C. J. J. Dachs, and D. B. M. Klaassen, "A new compact model for junctions in advanced CMOS technologies," in IEDM Tech. Dig., 2005, pp. 200-203.
-
(2005)
IEDM Tech. Dig
, pp. 200-203
-
-
Scholten, A.J.1
Smit, G.D.J.2
Durand, M.3
van Langevelde, R.4
Dachs, C.J.J.5
Klaassen, D.B.M.6
-
3
-
-
0033880784
-
A unified simulation of Schottky and ohmic contacts
-
Jan
-
K. Matsuzawa, K. Uchida, and A. Nishiyama, "A unified simulation of Schottky and ohmic contacts," IEEE Trans. Electron Devices, vol. 47, no. 1, pp. 103-108, Jan. 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, Issue.1
, pp. 103-108
-
-
Matsuzawa, K.1
Uchida, K.2
Nishiyama, A.3
-
4
-
-
0036494619
-
Advanced model and analysis of series resistance for CMOS scaling into nanometer regime - Part I: Theoretical derivation
-
Mar
-
S.-D. Kim, C.-M. Park, and J. C. S. Woo, "Advanced model and analysis of series resistance for CMOS scaling into nanometer regime - Part I: Theoretical derivation," IEEE Trans. Electron Devices, vol. 49, no. 3, pp. 457-466, Mar. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.3
, pp. 457-466
-
-
Kim, S.-D.1
Park, C.-M.2
Woo, J.C.S.3
-
5
-
-
33947703607
-
Compact analytical threshold-voltage model of nanoscale fully depleted strained-Si on Silicon-Germanium-on-Insulator (SGOI) MOSFETs
-
Mar
-
V. Venkataraman, S. Nawal, and M. J. Kumar, "Compact analytical threshold-voltage model of nanoscale fully depleted strained-Si on Silicon-Germanium-on-Insulator (SGOI) MOSFETs," IEEE Trans. Electron Devices, vol. 54, no. 3, pp. 554-562, Mar. 2007.
-
(2007)
IEEE Trans. Electron Devices
, vol.54
, Issue.3
, pp. 554-562
-
-
Venkataraman, V.1
Nawal, S.2
Kumar, M.J.3
-
8
-
-
0035834318
-
Recent advances in Schottky barrier concepts
-
Nov
-
R. T. Tung, "Recent advances in Schottky barrier concepts," Mater. Sci. Eng., R Rep., vol. 35, no. 1, pp. 1-138, Nov. 2001.
-
(2001)
Mater. Sci. Eng., R Rep
, vol.35
, Issue.1
, pp. 1-138
-
-
Tung, R.T.1
-
9
-
-
0036773157
-
Advanced source/drain engineering for box-shaped ultrashallow junction formation using laser annealing and pre-amorphization implantation in sub-100-nm SOI CMOS
-
Oct
-
S.-D. Kim, C.-M. Park, and J. C. S. Woo, "Advanced source/drain engineering for box-shaped ultrashallow junction formation using laser annealing and pre-amorphization implantation in sub-100-nm SOI CMOS," IEEE Trans. Electron Devices, vol. 49, no. 10, pp. 1748-1754, Oct. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.10
, pp. 1748-1754
-
-
Kim, S.-D.1
Park, C.-M.2
Woo, J.C.S.3
-
11
-
-
33847002058
-
Novel contacts and diodes for advanced silicon technology,
-
Ph.D. dissertation, ECTM, Delft Univ. Technol, Delft, The Netherlands
-
Q. W. Ren, "Novel contacts and diodes for advanced silicon technology," Ph.D. dissertation, ECTM, Delft Univ. Technol., Delft, The Netherlands, 2002.
-
(2002)
-
-
Ren, Q.W.1
-
12
-
-
70349158962
-
Current transport in the ultra-shallow abrupt Si and SiGe diodes
-
Veldhoven, The Netherlands
-
Q. W. Ren, L. K. Nanver, and J. W. Slotboom, "Current transport in the ultra-shallow abrupt Si and SiGe diodes," in Proc. SAFE, Veldhoven, The Netherlands, 2000, pp. 113-118.
-
(2000)
Proc. SAFE
, pp. 113-118
-
-
Ren, Q.W.1
Nanver, L.K.2
Slotboom, J.W.3
-
13
-
-
0026923596
-
A new analytical diode model including tunneling and avalanche breakdown
-
Sep
-
G. A. M. Hurkx, H. C. de Graaff, W. J. Kloosterman, and M. P. G. Knuvers, "A new analytical diode model including tunneling and avalanche breakdown," IEEE Trans. Electron Devices, vol. 39, no. 9, pp. 2090-2098, Sep. 1992.
-
(1992)
IEEE Trans. Electron Devices
, vol.39
, Issue.9
, pp. 2090-2098
-
-
Hurkx, G.A.M.1
de Graaff, H.C.2
Kloosterman, W.J.3
Knuvers, M.P.G.4
-
14
-
-
0034251009
-
Analytical theory of semiconductor p-n junctions and the transition between depletion and quasineutral region
-
Aug
-
A. Haggag and K. Hess, "Analytical theory of semiconductor p-n junctions and the transition between depletion and quasineutral region," IEEE Trans. Electron Devices, vol. 47, no. 8, pp. 1624-1629, Aug. 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, Issue.8
, pp. 1624-1629
-
-
Haggag, A.1
Hess, K.2
-
15
-
-
0025578686
-
A unified mobility model for device simulation
-
D. B. M. Klaassen, "A unified mobility model for device simulation," in IEDM Tech. Dig., 1990, pp. 357-360.
-
(1990)
IEDM Tech. Dig
, pp. 357-360
-
-
Klaassen, D.B.M.1
-
16
-
-
34547377090
-
Schottky barrier height modulation by ultra-shallow low-dose dopant diffusion
-
Shanghai, China
-
M. Popadić, L. K. Nanver, and T. L. M. Scholtes, "Schottky barrier height modulation by ultra-shallow low-dose dopant diffusion," in Proc. 8th ICSICT, Shanghai, China, 2006, pp. 469-471.
-
(2006)
Proc. 8th ICSICT
, pp. 469-471
-
-
Popadić, M.1
Nanver, L.K.2
Scholtes, T.L.M.3
-
17
-
-
47949107813
-
Ultra-shallow dopant diffusion from pre-deposited RPCVD monolayers of arsenic and phosphorus
-
Catania, Italy
-
M. Popadić, L. K. Nanver, and T. L. M. Scholtes, "Ultra-shallow dopant diffusion from pre-deposited RPCVD monolayers of arsenic and phosphorus," in Proc. 15th IEEE Int. Conf. Advanced Therm. Process. Semicond. RTP, Catania, Italy, 2007, pp. 95-100.
-
(2007)
Proc. 15th IEEE Int. Conf. Advanced Therm. Process. Semicond. RTP
, pp. 95-100
-
-
Popadić, M.1
Nanver, L.K.2
Scholtes, T.L.M.3
|