Structure and hardness of unbalanced magnetron sputtered TiBxNy thin films deposited at 500 °C

Surface and Coatings Technology

Volumn 201, Issue 16-17, 2007, Pages 7368-7374

  Lu, Y H ^a,b   Shen, Y G ^b   Wang, J P ^c   Zhou, Z F ^b   Li, K Y ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c BEIJING UNIVERSITY OF CIVIL ENGINEERING AND ARCHITECTURE   (China)

Author keywords

Hardness, Residual stress; Phase composition; Preferred orientation; TiBxNy thin films

Indexed keywords

AMORPHOUS FILMS; CRYSTAL STRUCTURE; HARDNESS; NANOCOMPOSITES; NANOCRYSTALLITES; PHASE COMPOSITION; PHASE DIAGRAMS; RESIDUAL STRESSES; TITANIUM COMPOUNDS;

NANOCOLUMN SIZE; PREFERRED ORIENTATION;

MAGNETRON SPUTTERING;

AMORPHOUS FILMS; CRYSTAL STRUCTURE; HARDNESS; MAGNETRON SPUTTERING; NANOCOMPOSITES; NANOCRYSTALLITES; PHASE COMPOSITION; PHASE DIAGRAMS; RESIDUAL STRESSES; TITANIUM COMPOUNDS;

EID: 34047271967     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.02.001     Document Type: Article

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