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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7361, Issue , 2009, Pages

Damage studies of multilayer optics for XUV free electron lasers

(18) Louis, E a Khorsand, A R a Sobierajski, R a,b Van Hattum, E D a Jurek, M b Klinger, D b Pelka, J B b Juha, L c Chalupsky, J c Cihelka, J c Hajkova, V c Jastrow, U d Toleikis, S d Wabnitz, H d Tiedtke, K d Gaudin, J e Gullikson, E M f Bijkerk, F g

a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN (Netherlands)

b INSTITUTE OF PHYSICS (Poland)

c INSTITUTE OF PHYSICS (Czech Republic)

d DESY (Germany)

e EUROPEAN XFEL GMBH (Germany)

f LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

g UNIVERSITY OF TWENTE (Netherlands)

Author keywords

Damage; FLASH; Multilayer; Optics; XFEL

Indexed keywords

13.5 NM; ABLATION THRESHOLDS; DAMAGE; DAMAGE THRESHOLD; EX SITU; FEMTOSECONDS; FLASH; FREE ELECTRON; IN-SITU; INTERACTION PROCESS; IRREVERSIBLE DAMAGE; MO/SI MULTILAYER; MULTILAYER OPTICS; POWER DENSITIES; PULSE ENERGIES; REFLECTOMETRY; TIME-RESOLVED; TIME-SCALES; XFEL; XUV FREE-ELECTRON-LASER; XUV PULSE; XUV RADIATION;

ATOMIC FORCE MICROSCOPY; ELECTRONS; FREE ELECTRON LASERS; INTEGRATED OPTOELECTRONICS; LASERS; LIGHT TRANSMISSION; MULTILAYERS; OPTICAL DATA STORAGE; OPTICAL INSTRUMENTS; OPTICAL MICROSCOPY; REFLECTION; ULTRAVIOLET DEVICES;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 69949147544 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.822257 Document Type: Conference Paper

Times cited : (20)

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- A.R. Khorsand, R. Sobierajski, E. Louis, S. Bruijn, E.D. van Hattum, R.W.E. van de Kruijs, M. Jurek, D. Klinger, J.B. Pelka, L. Juha, J. Chalupsky, J. Cihelka, V. Hajkova, U. Jastrow, S. Toleikis, H. Wabnitz, K. Tiedtke, J. Gaudin, J.Krzywinski, S. Hau-Riege, R. London, A. Gleeson, E. Gullikson and F. Bijkerk, to be submitted
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