Design and fabrication of highly heat-resistant Mo/Si multilayer soft X-ray mirrors with interleaved barrier layers

Journal of Synchrotron Radiation

Volumn 5, Issue 3, 1998, Pages 708-710

  Takenaka, Hisataka ^a   Ito, Hisashi ^b   Haga, Tsuneyuki ^c   Kawamura, Tomoaki ^d  

^a NTT Advanced Technology Corporation   (Japan)

^b KOGAKUIN UNIVERSITY   (Japan)

^c NTT CORPORATION   (Japan)

^d Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

Barrier layers; Heat resistance; Mo C Si C; Multilayers; X ray mirrors

Indexed keywords

EID: 0032381575     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049598000491     Document Type: Article

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