EUV imaging performance - Moving towards production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7470, Issue , 2009, Pages

  Van Setten, Eelco ^a   Lok, Sjoerd ^a   Van Dijk, Joep ^a   Kaya, Cemil ^a   Van Ingen Schenau, Koen ^a   Feenstra, Kees ^a   Meiling, Hans ^a   Wagner, Christian ^a  

^a ASML   (Netherlands)

Author keywords

EUV lithography; Imaging; Masks; Resist

Indexed keywords

FLASH MEMORY; LITHOGRAPHY; NANOTECHNOLOGY; ULTRAVIOLET DEVICES;

32-NM NODE; ACCEPTANCE TESTING; CD UNIFORMITY; EUV LITHOGRAPHY; FEATURE SIZES; FULL-FIELD; GATE LAYERS; GLOBAL INFRASTRUCTURE; IMAGING; IMAGING PERFORMANCE; LOGIC APPLICATIONS; PROCESS DEVELOPMENT; PROCESS WINDOW; RESIST; STEP-AND-SCAN; THROUGH PITCH;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 69949115177     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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