The random contact hole solutions for future technology nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Chen, Alek ^a   Hansen, Steve ^b   Moers, Marco ^c   Shieh, Jason ^a   Engelen, Andre ^c   Van Schenau, Koen Ingen ^c   Tseng, Shih En ^a  

^a ASML Taiwan Ltd   (Taiwan)

^b ASML US Inc   (United States)

^c ASML   (Netherlands)

Author keywords

EUV; Imaging solutions; Optical lithography; Random contact hole

Indexed keywords

COMPUTER SIMULATION; FORMAL LOGIC; IMAGING SYSTEMS; LIGHTING; OPTIMIZATION; ROBUST CONTROL;

CALIBRATED SIMULATIONS; IMAGING SOLUTIONS; RANDOM CONTACT HOLES; ROBUST PROCESS;

LITHOGRAPHY;

EID: 35148817491     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712447     Document Type: Conference Paper

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