Microstructural and optical properties of ZnO/(Ni) thin films prepared by DC magnetron sputtering

Journal of Alloys and Compounds

Volumn 484, Issue 1-2, 2009, Pages 489-493

  Gao, Fei ^a   Tan, Li Xin ^a   Wu, Zai Hua ^a   Liu, Xiao Yan ^b  

^a University of Commerce   (China)

^b CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Interstitial zinc; Ni doped; Photoluminescence properties; ZnO thin films

Indexed keywords

ABSORPTION EDGES; DC MAGNETRON SPUTTERING; DEFECT ENERGY LEVEL; INTERSTITIAL ZINC; MICRO-STRUCTURAL; NI-DOPED; OXYGEN PARTIAL PRESSURE; PHOTOLUMINESCENCE PEAK; PHOTOLUMINESCENCE PROPERTIES; PHOTOLUMINESCENCE SPECTRUM; PREFERRED ORIENTATIONS; RED-SHIFTED; SMOOTH SURFACE; ULTRAVIOLET PEAKS; ULTRAVIOLET PHOTOLUMINESCENCE; ULTRAVIOLET-VISIBLE SPECTRA; ZNO; ZNO THIN FILM; ZNO THIN FILMS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONDUCTION BANDS; CRYSTAL ORIENTATION; DOPING (ADDITIVES); ELECTRON MOBILITY; MAGNETRONS; METALLIC FILMS; NICKEL; OPTICAL FILMS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; OXYGEN; PARTIAL PRESSURE; PHOTOLUMINESCENCE; SEMICONDUCTING ZINC COMPOUNDS; SINGLE CRYSTALS; THIN FILMS; VACANCIES; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

FILM PREPARATION;

EID: 69949095746     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.04.133     Document Type: Article

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