Properties of ITO thin films deposited on amorphous and crystalline substrates with e-beam evaporation

Semiconductor Science and Technology

Volumn 19, Issue 6, 2004, Pages 695-698

  Wang, R X ^a   Beling, C D ^a   Djurisic A B ^a   Li, S ^a   Fung, S ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLINE MATERIALS; ELECTRON BEAMS; EVAPORATION; MICROSTRUCTURE; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS GLASS; INORGANIC LIGHT EMITTING DEVICES; OXYGEN CONCENTRATION; POLYMER SUBSTRATES;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 2942595867     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/19/6/006     Document Type: Article

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