Ionic debris assessment of various EUVL systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Castano, C H ^b   Ruzic, D N ^a   Srivastava, S N ^c   Thompson, K C ^a   Sporre, J ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

^c CYMER INC   (United States)

Author keywords

Diagnostic; ESA; EUV; Flux; Ion debris measurement

Indexed keywords

CHAMBER PRESSURE; COLLECTOR LIFETIME; COLLECTOR OPTICS; DEBRIS DATA; DEBRIS GENERATION; DEBRIS MEASUREMENTS; DEBRIS MITIGATION; DIAGNOSTIC; ELECTROSTATIC ENERGY ANALYZERS; ENERGY DISTRIBUTIONS; ESA; EUV; EUV SOURCE; EUVL SYSTEMS; ILLINOIS; ION DIAGNOSTICS; ION ENERGIES; ION FLUXES; ION SPECIES; NEUTRAL FLUX; OPERATIONAL CONDITIONS; PLASMA-MATERIAL INTERACTIONS; SEMATECH; UNIVERSITY OF ILLINOIS;

EXTREME ULTRAVIOLET LITHOGRAPHY; IONS; LIGHT SOURCES; OPTICAL MATERIALS; OPTICS; PLASMA DIAGNOSTICS; ULTRAVIOLET DEVICES;

DEBRIS;

EID: 67149084875     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.774156     Document Type: Conference Paper

References (6)

1. Agilent Technologies, Inc, www.agilent.com, Palo Alto, CA.
2. E. L. Antonsen, K. C. Thompson, M. R. Hendricks, D. A. Alman, B. E. Jurczyk, and D. N. Ruzic, "Ion Debris Characterization from a Z-Pinch Extreme Ultraviolet Light Source", Journal of Applied Physics 99(6), 063301 (2006)Burle Electro-Optics, www.burle.com, Sturbridge, MA.
3. Comstock, Inc. http://www.comstockinc.com, Oak Ridge, TN.
4. Ortec®, www.ortec-online.com, Oak Ridge, TN.
5. XTREME Technologies GmbH, www.xtremetec.de, Gottingen, Germany.
6. -80/20 Inc. www.8020.net, Warsaw, IN.